首页> 外国专利> FEEDBACK PARAMETER UPDATING TECHNIQUE IN PTYCHOGRAPHY ALGORITHM FOR RECONSTRUCTING DEFECTIVE IMAGES OF MASK AND PELLICLE FOR EXTREME ULTRAVIOLET EXPOSURE PROCESS TO OPTIMUM QUALITY

FEEDBACK PARAMETER UPDATING TECHNIQUE IN PTYCHOGRAPHY ALGORITHM FOR RECONSTRUCTING DEFECTIVE IMAGES OF MASK AND PELLICLE FOR EXTREME ULTRAVIOLET EXPOSURE PROCESS TO OPTIMUM QUALITY

机译:密码学算法中的反馈参数更新技术,用于重建面具和微粒的缺陷图像,以实现极高的紫外线暴露过程,以达到最佳质量

摘要

A feedback parameter updating technique in a ptychography algorithm for reconstructing defective images of a mask and a pellicle for an extreme ultraviolet exposure process to optimum quality may include a process of updating a feedback parameter at least one or more times during the image reconstruction process. The technique of the present invention can improve the resolution of the reconstructed images by continuously updating the feedback parameter while iteratively performing the ptychography algorithm.;COPYRIGHT KIPO 2017
机译:用于将用于极紫外曝光过程的掩模和防护膜的缺陷图像重构为最佳质量的,在指纹算法中的反馈参数更新技术可以包括在图像重构过程中至少一次或多次更新反馈参数的过程。本发明的技术可以通过在迭代执行刻印术算法的同时连续更新反馈参数来提高重建图像的分辨率。; COPYRIGHT KIPO 2017

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