Optical mask for optical alignment and optical alignment method

摘要

In the photo-alignment light mask 2 and the photo alignment method, the ends of the first light-projecting pattern 313 constituting the first photo mask figure 3 are aligned in the photo mask 2, and the second light- 4), it is possible to prevent the end portions of the first substrate unit 11 and the second substrate unit 12 from being exposed at the ends of the first substrate unit 11 and the second substrate unit 12, The first substrate unit 11 on the substrate and the first substrate unit 11 on the substrate are prevented from being present in the conventional photo-alignment manufacturing process, It is advantageous to reduce the distance between the two substrate units 12, thereby increasing the substrate utilization rate.