首页> 外国专利> SYNTHESIS METHOD OF QUANTUM DOT WITH MINIMIZED LATTICE BOUNDARY DEFECT BY CONTINUOUS CRYSTAL GROWTH AND QUANTUM DOT AT THE SAME

SYNTHESIS METHOD OF QUANTUM DOT WITH MINIMIZED LATTICE BOUNDARY DEFECT BY CONTINUOUS CRYSTAL GROWTH AND QUANTUM DOT AT THE SAME

机译:连续晶体生长和量子点相同的最小晶格边界缺陷量子点的合成方法

摘要

The present invention relates to a method to compose a quantum dot having a continuous crystal growth structure with minimized crystal boundary defect, and a quantum dot manufactured thereby. To this end, the method comprises: (a) a step of mixing at least one selected among zinc (Zn), cadmium (Cd), hydrargyrum (Hg), indium (In), copper (Cu), and lead (Pb) with unsaturated fatty acid, and adding an organic solvent to the mixture so as to synthesize a cation precursor; (b) a step of mixing at least one among selenium (Se), sulfur (S), phosphorus (P), and tellurium (Te) with any one series group selected from alkylphosphine series, alkylphosphine oxide series and trialkylphosphine series to synthesize an anionic precursor; (c) a step of adding at least one selected among magnesium (Mg), lithium (Li), silicon (Si), titanium (Ti), and aluminium (Al) as a metallic or an oxide doping material with the organic solvent in the step (a); and (d) a step of replacing a surface of a quantum dot with a halogen element unit.
机译:本发明涉及组成具有连续晶体生长结构且具有最小的晶体边界缺陷的量子点的方法,以及由此制造的量子点。为此,该方法包括:(a)混合选自锌(Zn),镉(Cd),水银(Hg),铟(In),铜(Cu)和铅(Pb)中的至少一种的步骤。用不饱和脂肪酸,向混合物中加入有机溶剂,以合成阳离子前体。 (b)将硒(Se),硫(S),磷(P)和碲(Te)中的至少一种与选自烷基膦系列,烷基氧化膦系列和三烷基膦系列中的任何一种的组混合的步骤阴离子前体(c)在有机溶剂中添加选自金属(Mg),锂(Li),硅(Si),钛(Ti)和铝(Al)中的至少一种作为金属或氧化物掺杂材料的步骤。步骤(a); (d)用卤素元素单元代替量子点的表面的步骤。

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