System and method for scalable infrared spectroscopic ellipsometry

摘要

Methods and systems for performing simultaneous spectroscopic measurements of semiconductor structures with ultraviolet, visible, and infrared wavelengths are presented herein. In another aspect, the wavelength error is reduced by directing the wavelength dispersion direction at the detector surface perpendicular to the projection of the incident surface with respect to the detector surface. In another aspect, a wide range of infrared wavelengths are detected by a detector including a plurality of light-sensitive regions having different sensitizing characteristics. The collected light is linearly dispersed throughout the detector surface depending on the wavelength. Each different light sensitive area is arranged in the detector to sense a different range of incident wavelengths. In this way, a wide range of infrared wavelengths are detected with a high signal-to-noise ratio by a single detector. These features enable high throughput measurements of high aspect ratio structures with high throughput, high accuracy and high accuracy.