首页> 外国专利> 3D Method and apparatus for deposition of atomic layer onto 3D printed matters

3D Method and apparatus for deposition of atomic layer onto 3D printed matters

机译:用于将原子层沉积到3D打印品上的3D方法和设备

摘要

Disclosed is a technique in which an atomic layer is deposited on the output of an existing 3D printer so that the application of the 3D printer output product is expanded and various desired functions can be realized. According to an aspect of the present invention, there is provided a method of depositing an atomic layer on a 3D printer output capable of realizing a desired function by applying an ALD process after 3D output of a semi-finished product such as an outer shape of a product, an electrode portion, and a PCB based on a 3D printer. According to the present invention, a predetermined functional layer can be formed on an atomic layer basis even in a 3D printing semi-finished product having a complicated structure. According to another aspect of the present invention, a semi-finished product output to a 3D printer in one equipment is transferred to a load lock chamber for post-processing using a transfer robot arm, and an ALD process is applied so that a desired function can be implemented.
机译:公开了一种技术,其中原子层沉积在现有3D打印机的输出上,从而扩展了3D打印机输出产品的应用,并且可以实现各种所需功能。根据本发明的一个方面,提供了一种在3D打印机输出上沉积原子层的方法,该方法能够通过在半成品(例如外部形状)的3D输出之后应用ALD工艺来实现期望的功能。产品,电极部分和基于3D打印机的PCB。根据本发明,即使在具有复杂结构的3D打印半成品中,也可以基于原子层形成预定的功能层。根据本发明的另一方面,将输出到一个设备中的3D打印机的半成品转移到装载锁定室,以便使用转移机械手进行后处理,并应用ALD工艺以实现所需的功能。可以实现。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号