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LIGHTNING RISK ANALYSIS SYSTEM AND LIGHTNING RISK ANALYSIS METHOD USING THE SAME

机译:雷击危险分析系统及使用该雷击危险分析方法的方法

摘要

The present invention relates to a lighting risk analysis system that can provide information on lighting risk by use of parameters, such as lighting occurring density and intensity, and topography, and a lighting risk analysis method using the same. The lighting risk analysis method includes the steps of: obtaining lighting observation information including any one of information on a lighting occurring position, error information and lighting intensity; setting a lighting risk area in an analysis area, which is divided by a plurality of grids based on the lighting observation information, on the basis of the lighting occurring position; computing a detailed risk on the respective grids included in the lighting risk area, the detailed risk including at least one of density risk, intensity risk, topography risk and UVIL risk; and obtaining a degree of lighting risk based on the detailed risk.
机译:照明风险分析系统及照明风险分析方法技术领域本发明涉及一种照明风险分析系统以及使用该照明风险分析方法的照明风险分析方法,其中,该照明风险分析系统可以通过使用诸如照明发生密度和强度以及地形的参数来提供照明风险的信息。照明风险分析方法包括以下步骤:获得照明观察信息,该照明观察信息包括与照明发生位置,误差信息和照明强度有关的信息中的任何一种;以及基于照明发生位置,在基于照明观察信息被多个网格划分的分析区域中设置照明风险区域;计算包括在照明风险区域中的各个网格上的详细风险,该详细风险包括密度风险,强度风险,地形风险和UVIL风险中的至少一项;并根据详细风险获得一定程度的照明风险。

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