METHOD FOR EVALUATING QUALITY OF OXIDE SEMICONDUCTOR THIN FILM AND LAMINATED BODY HAVING PROTECTIVE FILM ON SURFACE OF OXIDE SEMICONDUCTOR THIN FILM AND METHOD FOR MANAGING QUALITY OF OXIDE SEMICONDUCTOR THIN FILM

摘要

Provided is a method for accurately and easily evaluating the quality of a laminate having an oxide semiconductor thin film and a protective film on the surface of the oxide semiconductor thin film, and a method for controlling quality of an oxide semiconductor thin film. The present invention relates to a method for evaluating the quality of a laminate having an oxide semiconductor thin film and a protective film on the surface of the oxide semiconductor thin film. The oxide semiconductor thin film is formed on a substrate and then the electronic state of the oxide semiconductor thin film is contact- The method comprising: a first step of evaluating a defect caused by an in-film defect of the oxide semiconductor thin film by measuring a defect of the oxide semiconductor thin film on the surface of the oxide semiconductor thin film processed by the conditions determined based on the evaluation; And a second step of evaluating a defect caused by an interface defect between the oxide semiconductor thin film and the protective film by measuring an electronic state of the oxide semiconductor thin film by a method or a non-contact method.