- METHOD FOR STRUCTURING A SURFACE BY MEANS OF ION-BEAM ETCHING STRUCTURED SURFACE AND USES

摘要

The present invention relates to a method of structuring a surface, that is, by ion-beam etching using an optionally neutralized ion beam, the height (H) of the submicrometer size and the micrometer size (2) having at least one characteristic lateral dimension (W), referred to as submicrometer size width, or a method for structuring a surface for forming at least one set of concave and convex portions, the method comprising the steps of Said material having a thickness of at least 100 nm, said material being a solid mixed material and being a single or mixed oxide of the element (s) with at least 40%, in particular at least 40% and at least 94% (S), wherein the mole percent of species in the material is in the range of 6% to 50% and less than the mole% of the oxides, and at least a majority of the species has a maximum characteristic dimension of less than 50 nm. Comprising at least one species, in particular a metal, said hybrid material being particularly metastable prior to said etching; Selectively heating the hybrid material prior to the etching; And 1 cm RTI ID = 0.0 ²Structuring the surface of the hybrid material with an etching time of less than 1 hour on an etched surface in excess of 1 hour; the structuring step optionally includes heating of the hybrid material.;