The talented esc grounding kits of uniformity tuning are used for ranging PVD chamber

摘要

The embodiment of the present invention relates generally to the semiconductor process chamber and a kind of semiconductor process chamber of grounding kit, with grounding kit. More specifically, embodiment described here is related to a kind of grounding kit and generates asymmetric grounding path together, selects to significantly decrease off-centered RF power transmissions caused by asymmetry.