METHOD OF USING A SURFACTANT-CONTAINING SHRINKAGE MATERIAL TO PREVENT PHOTORESIST PATTERN COLLAPSE CAUSED BY CAPILLARY FORCES

摘要

A first photoresist pattern and a second photoresist pattern are formed on the substrate. The first photoresist pattern is separated from the second photoresist pattern by a gap. The chemical mixture is coated on the first and second photoresist patterns. A chemical mixture contains a chemical substance and surface active particles mixed in the chemical substance. The chemical mixture fills the gap. A baking process is performed on the first and second photoresist patterns, and the baking process causes the gap to contract. At least some surface active particles are disposed at the sidewall boundary of the gap. A developing process is performed on the first and second photoresist patterns. The developing process removes the chemical mixture in the gap and on the photoresist pattern. The surface active particles disposed at the sidewall boundary of the gap reduce the capillary influence during the development process.