A process for the adjustment of an imaging behaviour of a projection objective and adjustment system

摘要

A process for the adjustment of an imaging behaviour of a projection objective (20) for a microlithographic projection exposure system (10) comprises the steps of: providing a state characterization (54) of the projection objective, generating a respective manipulation before the administration (58) for at least two, the manipulation of the imaging behaviour of the projection objective, which serves to manipulation unit freely grade (72 - 1, 72 - 2, 72 - 5, 72 - 6) by means of optimization of a the state characterization of the projection objective comprehensive quality function, taking into account at least one boundary condition for a by means of the optimization to that end imaging behavior of the projection objective, wherein the manipulation unit degrees freely at least one respective previously known reaction inaccuracy is associated with which, during a reaction of the manipulation in front of data with respect to the respective manipulation unit degree occurs freely, and wherein in the boundary condition the imaging behavior of the projection objective is to be achieved by at least one term is shown, which the respective reaction inaccuracy of the manipulation includes before doses. Furthermore, the process comprises the step of reacting of the generated manipulation in front of data with respect to the corresponding manipulation unit extent freely.n="65"