Method for assigning field facets to pupil facets to create illumination light illumination channels in an illumination system in an EUV projection exposure apparatus

摘要

In the assignment of field facets to pupil facets (11) to create illumination light illumination channels in an illumination system of a projection exposure apparatus, a far-field variation of an illumination light parameter is first identified via a far field of a light source of the projection exposure apparatus. Subsequently, the field facets are assigned to the pupil facets (11) so that the identified far-field variation of the illumination light parameter between different field facets or over one and the same field facet is used for optimization, compensation or correction of object illumination parameters. The result is an optimized to achieve very high pattern resolutions object field illumination.