首页> 外国专利> METHOD FOR MAKING A MEMS AND / OR NEMS STRUCTURE COMPRISING AT LEAST TWO ELEMENTS SUSPENDED AT A SUPPORT AT DIFFERENT DISTANCES FROM SAID SUPPORT

METHOD FOR MAKING A MEMS AND / OR NEMS STRUCTURE COMPRISING AT LEAST TWO ELEMENTS SUSPENDED AT A SUPPORT AT DIFFERENT DISTANCES FROM SAID SUPPORT

机译:在与上述支持不同距离的情况下,制作至少包含两个元素的MEMS和/或NEMS结构的方法

摘要

Method for producing a microelectromechanical structure and comprising two elements suspended on a support, a cavity made in the support, said cavity having two different depths, comprising: - producing a mask on an element comprising a substrate and a structured layer formed on the substrate, said structured layer comprising the two elements to be suspended above the cavity, the mask being formed above the structured layer, said mask having openings of different sections, the openings being divided into two zones, each zone having openings of the same section, - anisotropic etching of the element so as to define the two depths under the two elements suspended in the substrate through the structured layer, - isotropic etching of the element so as to make the cavity under the suspended elements.
机译:一种用于制造微机电结构的方法,该方法包括:将两个元件悬浮在支撑体上;在支撑体中制成的空腔,所述空腔具有两个不同的深度,包括:-在包括基板和在基板上形成的结构化层的元件上制造掩模,所述结构化层包括要悬挂在空腔上方的两个元件,所述掩模形成在结构化层上方,所述掩模具有不同截面的开口,所述开口分为两个区域,每个区域具有相同截面的开口,-各向异性蚀刻元件,以限定通过结构化层悬置在衬底中的两个元件下方的两个深度;-各向同性蚀刻,以在悬置元件下方形成空腔。

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