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METHOD FOR MAKING A MEMS AND / OR NEMS STRUCTURE COMPRISING AT LEAST TWO ELEMENTS SUSPENDED AT A SUPPORT AT DIFFERENT DISTANCES FROM SAID SUPPORT
METHOD FOR MAKING A MEMS AND / OR NEMS STRUCTURE COMPRISING AT LEAST TWO ELEMENTS SUSPENDED AT A SUPPORT AT DIFFERENT DISTANCES FROM SAID SUPPORT
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机译:在与上述支持不同距离的情况下,制作至少包含两个元素的MEMS和/或NEMS结构的方法
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摘要
Method for producing a microelectromechanical structure and comprising two elements suspended on a support, a cavity made in the support, said cavity having two different depths, comprising: - producing a mask on an element comprising a substrate and a structured layer formed on the substrate, said structured layer comprising the two elements to be suspended above the cavity, the mask being formed above the structured layer, said mask having openings of different sections, the openings being divided into two zones, each zone having openings of the same section, - anisotropic etching of the element so as to define the two depths under the two elements suspended in the substrate through the structured layer, - isotropic etching of the element so as to make the cavity under the suspended elements.
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