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SUPPORT SUBSTRATE FOR RADIOISOTOPE PRODUCTION, TARGET PLATE FOR RADIOISOTOPE PRODUCTION, AND PRODUCTION METHOD FOR SUPPORT SUBSTRATE
SUPPORT SUBSTRATE FOR RADIOISOTOPE PRODUCTION, TARGET PLATE FOR RADIOISOTOPE PRODUCTION, AND PRODUCTION METHOD FOR SUPPORT SUBSTRATE
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机译:用于放射性同位素生产的支持基质,用于放射性同位素生产的靶板以及用于支持基质的生产方法
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摘要
Provided is a target plate for radioisotope production that has sufficient durability and sufficient heat resistance for use in radioisotope production and that is capable of reducing the extent of radioactivation. In a target plate (10) for radioisotope production, a support substrate (2), which supports a target (1), includes a graphite film(s). The thermal conductivity in a surface direction of the graphite film(s) is 1200 W/(m·K) or greater, and the thickness of the graphite film(s) is 0.05 µm or greater and 100 µm or less.
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