MANAGEMENT METHOD OF IMPRINT DEVICE, IMPRINT DEVICE, MANAGEMENT METHOD OF PLANARIZATION LAYER FORMATION DEVICE, AND ARTICLE MANUFACTURING METHOD

摘要

To provide a technique advantageous for determining necessity of exchange of a chemical filter in an imprint device with high accuracy.SOLUTION: A management method manages an imprint device 10 having a processing part P performing imprint processing for forming a layer of imprint material on a board w1 by using a mould M, a chamber C for housing the processing part P, and a chemical filter 18 for removing chemical impurities contained in the gas flowing inside the chamber C. The management method has a detention step of detaining a test board in the chamber C during execution of imprint processing, a formation step of forming a layer of imprint material on the test board by the processing part P after the detention step, an inspection step of inspecting the layer formed on the test board in the formation step, and a determination step of determining necessity of exchange of chemical filter 18 on the basis of detection results obtained in the inspection step.SELECTED DRAWING: Figure 1