Knife-edge group of photolithography apparatus, large-field photolithography apparatus, and exposure method

摘要

A knife edge group of a photolithography apparatus, a large field of view photolithography apparatus, and an exposure method, wherein at the time of measurement, the scanning direction knife edge moves once to perform light irradiation measurement, and moves to above the alignment mark after the measurement is completed. During exposure, the scan direction knife edge group moves at the same speed and in the same direction following the mask stage so that the scan direction knife edge group remains stationary relative to the alignment marks of the mask (4). In the case of full field exposure, the non-scanning direction knife edge group does not need to move, and in the case of local exposure, the non-scanning direction knife edge group is moved to the local exposure field of view and formed by the non-scanning direction knife edge group A shape is formed on the window to control the light spot of the illumination light, and then the non-scanning direction knife edge group can be kept stationary, simply moving the mask stage and the work stage, the exposure field from the exposure field The other exposure areas move to the exposure field and exposure can be performed continuously, thereby completing the exposure of all the exposure areas. There is no need to provide a plurality of sets of knife edge groups, the structure is simple, and the demand for control accuracy can be reduced.