METHOD OF EXAMINING A GAS SEPARATION QUALITY OF A GAS SEPARATION PASSAGE IN A VACUUM CHAMBER, AND VACUUM PROCESSING APPARATUS

摘要

According to one aspect of the present disclosure, a method of examining a gas separation quality of a gas separation passage (20) extending between a first vacuum processing region (10) and at least one second vacuum processing region (12) in a vacuum chamber (2) is provided, wherein the gas separation passage (20) is configured as a passageway for a substrate while reducing a gas flow from the first vacuum processing region (10) into the at least one second vacuum processing region (12). The method comprises: introducing a test gas (31) into the first vacuum processing region (10); and measuring a first content (33) of the test gas in a background gas in the at least one second vacuum processing region (12). According to a second aspect, a vacuum processing apparatus (1) and a vacuum deposition apparatus (100, 500) for performing the method are provided.