High power electrostatic chuck design with high frequency coupling

摘要

An electrostatic chuck having high frequency coupling suitable for use in a high power plasma environment is described. In some examples, the chuck includes a base plate, a top plate, a first electrode in the top plate proximate to the top surface of the top plate to electrostatically grip the workpiece, and spaced from the first electrode. And a second electrode in the top plate disposed with a gap therebetween, the first electrode and the second electrode being coupled to a power source for electrostatically charging the first electrode.