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GRAIN POLISHING PLANT AND CONTROL METHOD FOR GRAIN POLISHING PLANT

机译:谷物抛光设备及谷物抛光设备的控制方法

摘要

To provide a grain polishing plant capable of efficiently polishing grains of a very small amount of materials even by a large-sized grain polishing device efficiently by generating no loss, and by generating no unevenness (in a target quality by performing neither two stirs nor three stirs), and a control method for grain polishing plant.SOLUTION: A grain polishing plant according to the present invention comprises a raw material tank, a storage container, a grain polishing device connected with the exhaust port of the raw material tank and the exhaust port of the storage container, a transportation route that transports grains exhausted out of the exhaust port of the grain polishing device to a next process, a switching device provided halfway in the transportation route, and a recovery route that recovers grains exhausted out by branching from the switching device, where the storage container stores grains exhausted out of the grain polishing device, until the grain polishing degree reaches a predetermined grain polishing degree, in an order of being exhausted out of the grain polishing device, and supplied to the grain polishing device by a first-in first-out system.SELECTED DRAWING: Figure 1
机译:本发明提供一种谷物研磨设备,其即使不使用大型的谷物研磨装置,也不会产生损失,也不会产生不均(通过进行两次搅拌或三次均未达到目标品质),也能够有效地对非常少量的材料的晶粒进行有效地研磨。解决方案:根据本发明的谷物抛光设备包括原料槽,存储容器,与原料槽的排气口和排气口相连的谷物抛光装置。储藏容器的端口,将从谷物抛光装置的排出口排出的谷粒输送至下一工序的输送路径,在该输送路径的途中设置的切换装置,以及回收从分支中排出的谷物的回收路径。切换装置,其中存储容器存储从谷物抛光装置中排出的谷物,直到谷物抛光度达到预定的颗粒抛光度,顺序是从颗粒抛光设备中抽出,并通过先进先出系统提供给颗粒抛光设备。选图:

著录项

  • 公开/公告号JP2018202320A

    专利类型

  • 公开/公告日2018-12-27

    原文格式PDF

  • 申请/专利权人 TOYO RICE CO LTD;

    申请/专利号JP20170110507

  • 发明设计人 SAIGA KEIJI;SAKO MITSUHIRO;

    申请日2017-06-04

  • 分类号B02B7/00;B02B7/02;

  • 国家 JP

  • 入库时间 2022-08-21 12:21:59

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