APPARATUS OF CONTROLLING TEMPERATURE IN WAFER CLEANING EQUIPMENT AND METHOD OF CONTROLLING TEMPERATURE USING THE SAME

摘要

To provide an apparatus of controlling a temperature of wafer cleaning equipment, capable of quickly and accurately determining a detection abnormality of a temperature sensor located inside a cleaning tank, and a method of controlling a temperature using the same.SOLUTION: An apparatus of controlling a temperature of wafer cleaning equipment and a method of controlling a temperature using the same determine an abnormal operation of a first temperature sensor installed at an inner side of an inner tank by comparing a measurement value of the first temperature sensor 120 installed at the inner side of the inner tank 111 of a cleaning tank 110 and a measurement value of a second temperature sensor 140 installed at a transfer robot 130 configured to transfer wafers to the inner side of the inner tank. Meanwhile, a method of controlling a temperature of wafer cleaning equipment determines an abnormal operation of temperature sensors by comparing measurement values of the temperature sensors installed at an inner side of each of inner tanks in a state of supplying deionized water of a set temperature to each of the inner tanks after discharging a cleaning solution accommodated in each of the inner tanks of a plurality of cleaning tanks.SELECTED DRAWING: Figure 4