Temperature control apparatus for wafer cleaning equipment and temperature control method using the same

摘要

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a temperature control apparatus for a wafer cleaning apparatus capable of quickly and accurately determining an abnormality detection of a temperature sensor positioned inside a cleaning tank and a temperature control method using the same. The apparatus for controlling temperature of a wafer cleaning apparatus according to the present invention and the method for controlling temperature using the apparatus are characterized in that the measured value of the first temperature sensor provided inside the inner tank and the measured value of the second temperature sensor provided on the transfer robot for transferring the wafer to the inner tank It is possible to judge abnormal operation of the first temperature sensor provided inside the inner tank. In the method of controlling the temperature of the wafer cleaning equipment according to the present invention, the cleaning liquid contained in each of the inner baths is discharged, and then the pure water of the set temperature is supplied to each inner bath, The abnormality of the temperature sensors can be judged.