首页> 外国专利> Antifogging antireflective film, cover substrate with antifogging antireflective film, and method for producing antifogging antireflective film

Antifogging antireflective film, cover substrate with antifogging antireflective film, and method for producing antifogging antireflective film

机译:防雾抗反射膜,具有防雾抗反射膜的覆盖基板以及制造防雾抗反射膜的方法

摘要

PROBLEM TO BE SOLVED: To provide an antifogging, antireflective film that eliminates the need for special excitation with ultraviolet rays and maintains hydrophilic properties stably for a long period in the absence of sunlight, has an average reflectance of 1% or lower within an arbitrary wavelength range of 200 nm of a wavelength range of 400-1500 nm, and can secure a clear visual field even in an environment of fog, rainfall, temperature variation, etc.SOLUTION: The present invention relates to an antifogging, antireflective film characterized in that: a first dielectric film 30 and a second dielectric film 40 having a lower reflectance than the first dielectric film are laminated alternately on at least one surface of a transparent base material 10 by four layers or more; the top layer is a second dielectric film; the first dielectric film is made of an inorganic compound exhibiting photocatalytic reaction; the second dielectric film is made of a hydrophilic compound; the antifogging, antireflective film has a reflectance of 1% or less within a range from a first arbitrary specified wavelength a nm to b nm as a second specified wavelength a+200 nm in a wavelength range of 400 to 1,500 nm; and a laminate surface has an angle of 10 degrees or less of contact with water.SELECTED DRAWING: Figure 1
机译:要解决的问题:提供一种防雾,防反射膜,该膜无需使用紫外线进行特殊激发,并且在没有阳光的情况下可以长期稳定地保持亲水性,并且在任意波长下的平均反射率为1%或更低防雾,防反射膜技术领域本发明涉及一种防雾,防反射膜,其特征在于,防雾,防反射膜在200nm的波长范围内,且在400-1500nm的波长范围内,即使在雾,降雨,温度变化等环境下也能确保清晰的视野。在透明基材10的至少一个表面上交替地层叠四层以上的第一电介质膜30和反射率比第一电介质膜低的第二电介质膜40。顶层是第二介电膜;第一介电膜由表现出光催化反应的无机化合物制成。第二介电膜由亲水性化合物制成。防雾抗反射膜在400至1,500nm的波长范围内,在从第一任意指定波长a nm至b nm作为第二指定波长a + 200 nm的范围内的反射率为1%以下。层压板表面与水的接触角为10度或更小。图1

著录项

  • 公开/公告号JP6513486B2

    专利类型

  • 公开/公告日2019-05-15

    原文格式PDF

  • 申请/专利权人 ジオマテック株式会社;

    申请/专利号JP20150107538

  • 发明设计人 中島 健太郎;

    申请日2015-05-27

  • 分类号G02B1/115;G02B1/18;B32B7/023;B32B9;

  • 国家 JP

  • 入库时间 2022-08-21 12:21:13

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