CVD-SiC film manufacturing method and CVD-SiC film manufactured by the method

摘要

Disclosed are a dense CVD-SiC film having few pores and a composite material, and a production method for efficiently producing such a CVD-SiC film. A CVD-SiC film manufacturing method using a CVD method in which a source gas is supplied and deposited on a substrate in a CVD furnace, and the CVD method is a photo-CVD method for irradiating a substrate with light. And the film-forming temperature (t [K]) and the total pressure (p [kPa]) satisfy | fill following formula (1), The manufacturing method of the CVD-SiC film | membrane characterized by the above-mentioned. p ≧ −0.04t + 72 (1) [Selection] FIG.