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Ion-assisted deposition for coating rare earth oxide films on process rings
Ion-assisted deposition for coating rare earth oxide films on process rings
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机译:离子辅助沉积以在工艺环上涂覆稀土氧化物膜
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摘要
A method of manufacturing an article comprises providing a ring for an etch reactor. Ion assisted deposition (IAD) is then performed to deposit a protective layer on at least one surface of the ring, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 μm and an average surface roughness of less than 6 micro-inches.
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