Beam scanning apparatus, pattern drawing apparatus, and accuracy inspection method for pattern drawing apparatus

摘要

The exposure apparatus (EX) projects a processing beam (LBn) onto each of a plurality of reflecting surfaces (RP) of a polygon mirror (PM) that rotates about a rotation axis (AXp), and a plurality of reflecting surfaces (RP) And the processing beam (LBn) reflected by each of the above is scanned on the substrate (P) through the fθ lens system (FT). The exposure apparatus (EX) includes an origin sensor that generates an origin signal (SZn) each time the plurality of reflecting surfaces (RP) of the polygon mirror (PM) have a predetermined prescribed angle, and a plurality of reflecting surfaces (RP). And a correction unit for generating a corrected origin signal (SZn ′) corrected by a correction value according to the variation amount of the time interval of the origin signal (SZn) generated corresponding to each of.