Backscattered electron (BSE) imaging using a multi-beam tool

摘要

A multi-beam scanning electron microscopy system is disclosed. The multi-beam scanning electron microscopy system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to generate a plurality of beamlets using electrons provided by the electron source and to deliver one of the plurality of beamlets to the target in one time instance. The multi-beam scanning electron microscopy system may further include a detector configured to generate an image of the target based at least in part on electrons backscattered from the target.