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Electron gun, three-dimensional additive manufacturing apparatus, and electron gun control method

机译:电子枪,三维增材制造装置和电子枪控制方法

摘要

There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening pass through a third opening and impinge as an electron beam (B1) on a powdered sample (8). The controller (22) sets the bias voltage and the control voltage based on combination conditions of the bias voltage and control voltage to maintain the brightness of the beam constant.
机译:如果不能使用限流孔,则公开了一种控制电子枪而不引起电子束亮度降低的方法。电子枪(10)具有阴极(11),韦氏电极(12),控制电极(13),阳极(14)和控制器(22)。韦氏电极(12)具有第一开口,阴极的尖端插入其中,并且使从阴极(11)的尖端发射的热电子聚焦。从阴极(11)的尖端发射的热电子通过控制电极(13)进入第二开口。阳极(14)使从阴极(11)发射的热电子加速,使得穿过第二开口的热电子穿过第三开口,并作为电子束(B1)撞击在粉末状样品(8)上。控制器(22)基于偏置电压和控制电压的组合条件来设置偏置电压和控制电压,以保持光束的亮度恒定。

著录项

  • 公开/公告号JP6437316B2

    专利类型

  • 公开/公告日2018-12-12

    原文格式PDF

  • 申请/专利权人 日本電子株式会社;

    申请/专利号JP20150003094

  • 发明设计人 佐藤 崇;

    申请日2015-01-09

  • 分类号H01J37/04;H01J37/063;H01J37/06;H01J37/302;

  • 国家 JP

  • 入库时间 2022-08-21 12:18:29

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