PROBLEM TO BE SOLVED: To provide a sputtering target for use in deposition of a granular type thin film in a magnetic recording medium and having a high sputtering rate and a discharging stability.SOLUTION: A sintered sputtering target having a structure in which C (carbon) particles are dispersed in a parent metal composed of Fe and Pt, is provided in which a peak intensity ratio (I/I) in a microscopic Raman scattering spectrum measured on the C particles is less than 1.0 at a measurement point 2 m or more away from the interface with the mother metal, and is 1.0 or more at a measurement point 2 m or less away from the interface with the mother metal.
展开▼
