首页> 外国专利> LOW WEAR DEBRIS POLYOXYMETHYLENE COMPOSITION AND RAMP MADE OF SUCH POLYOXYMETHYLENE COMPOSITION SUITABLE FOR VARIOUS HDD DESIGN

LOW WEAR DEBRIS POLYOXYMETHYLENE COMPOSITION AND RAMP MADE OF SUCH POLYOXYMETHYLENE COMPOSITION SUITABLE FOR VARIOUS HDD DESIGN

机译:低磨损碎屑聚氧乙烯成分和适用于各种硬盘设计的这种聚氧乙烯成分的粗制材料

摘要

A polyoxymethylene composition includes a polyoxymethylene copolymer with 1,3-dioxolane as a comonomer, a wear resistance agent, a nucleating agent, and an antistatic agent. A ramp is made of the polyoxymethylene composition. The ramp and the polyoxymethylene have excellent low-wear-debris property. The low wear debris polyoxymethylene composition can be used to produce a ramp for various designs of hard disks, such as PMR (perpendicular recording) + TDMR (Two-Dimensional Magnetic Recording), SMR (Shingled Magnetic Recording), HAMR + (HAMR (Heat Assisted Magnetic Recording)+ SMR + TDMR), BPMR + (BPMR (Bit Pattern Media Recording) + SMR + TDMR), and helium-filled hard disk.
机译:聚甲醛组合物包括具有1,3-二氧戊环作为共聚单体的聚甲醛共聚物,耐磨剂,成核剂和抗静电剂。斜面由聚甲醛组合物制成。坡道和聚甲醛具有优异的低磨损性。低磨损碎片聚甲醛组合物可用于生产各种硬盘设计的坡道,例如PMR(垂直记录)+ TDMR(二维磁记录),SMR(带状磁记录),HAMR +(HAMR(热辅助磁记录)+ SMR + TDMR),BPMR +(BPMR(位模式媒体记录)+ SMR + TDMR)和充氦的硬盘。

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