首页> 外国专利> LOW WEAR DEBRIS POLYOXYMETHYLENE COMPOSITION AND A RAMP MADE OF SUCH POLYOXYMETHYLENE COMPOSITION SUITABLE FOR VARIOUS HDD DESIGNS

LOW WEAR DEBRIS POLYOXYMETHYLENE COMPOSITION AND A RAMP MADE OF SUCH POLYOXYMETHYLENE COMPOSITION SUITABLE FOR VARIOUS HDD DESIGNS

机译:低磨损的碎片聚氧乙烯组成和适用于各种硬盘设计的这种聚氧乙烯组成的斜面

摘要

A polyoxymethylene composition includes a polyoxymethylene copolymer with 1,3-dioxolane as a comonomer, a wear resistance agent, a nucleating agent, and an antistatic agent. A ramp is made of the polyoxymethylene composition. The ramp and the polyoxymethylene have excellent low-wear-debris property. The low wear debris polyoxymethylene composition can be used to produce a ramp for many different designs of hard disks, such as PMR (perpendicular recording)+TDMR (Two-Dimensional Magnetic Recording), SMR (Shingled Magnetic Recording), HAMR+ (HAMR (Heat Assisted Magnetic Recording)+SMR+TDMR), BPMR+ (BPMR (Bit Pattern Media Recording)+SMR+TDMR), and helium-filled hard disk.
机译:聚甲醛组合物包括具有1,3-二氧戊环作为共聚单体的聚甲醛共聚物,耐磨剂,成核剂和抗静电剂。斜面由聚甲醛组合物制成。坡道和聚甲醛具有优异的低磨损性。低磨损碎片聚甲醛组合物可用于为许多不同设计的硬盘生产坡道,例如PMR(垂直记录)+ TDMR(二维磁记录),SMR(叠片磁记录),HAMR + (HAMR(热辅助磁记录)+ SMR + TDMR),BPMR + (BPMR(位模式媒体记录)+ SMR + TDMR)和充氦硬盘。

著录项

  • 公开/公告号US2018079893A1

    专利类型

  • 公开/公告日2018-03-22

    原文格式PDF

  • 申请/专利权人 MIN AIK TECHNOLOGY CO. LTD.;

    申请/专利号US201615272447

  • 发明设计人 HUNG-YU CHI;JUNG-PAO CHANG;CHI-EN LIN;

    申请日2016-09-22

  • 分类号C08K13/02;G11B5/55;

  • 国家 US

  • 入库时间 2022-08-21 13:03:31

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