首页> 外国专利> Production method for Ramp;#x2014;Tamp;#x2014;B-based sintered magnet

Production method for Ramp;#x2014;Tamp;#x2014;B-based sintered magnet

机译:R& T& x2014; B基烧结磁体的生产方法

摘要

A step of, while an RLM alloy powder (where RL is Nd and/or Pr; M is one or more elements selected from among Cu, Fe, Ga, Co, Ni and Al) and an RH compound powder (where RH is Dy and/or Tb; and the RH compound is an RH fluoride and/or an RH oxyfluoride) are present on the surface of a sintered R-T-B based magnet, performing a heat treatment at a sintering temperature of the sintered R-T-B based magnet or lower is included. The RLM alloy contains RL in an amount of 50 at % or more, and the melting point of the RLM alloy is equal to or less than the temperature of the heat treatment. The heat treatment is performed while the RLM alloy powder and the RH compound powder are present on the surface of the sintered R-T-B based magnet at a mass ratio of RLM alloy:RH compound=9.6:0.4 to 5:5.
机译:RLM合金粉末(RL为Nd和/或Pr; M为选自Cu,Fe,Ga,Co,Ni和Al中的一种或多种元素)和RH化合物粉末(RH为Dy)的步骤(和/或Tb;并且RH化合物是RH氟化物和/或RH氟化氧)存在于RTB烧结磁体的表面上,包括在RTB烧结磁体的烧结温度或更低的温度下进行热处理。 RLM合金包含50原子%以上的RL,并且RLM合金的熔点等于或小于热处理的温度。在RLM合金粉末和RH化合物粉末以RLM合金∶RH化合物= 9.6∶0.4至5∶5的质量比存在于烧结的R-T-B基磁体的表面上的同时进行热处理。

著录项

  • 公开/公告号US10418171B2

    专利类型

  • 公开/公告日2019-09-17

    原文格式PDF

  • 申请/专利权人 HITACHI METALS LTD.;

    申请/专利号US201515533671

  • 发明设计人 SHUJI MINO;

    申请日2015-12-04

  • 分类号H01F41/02;H01F1/057;B22F3/24;B22F3/10;B22F7/02;C22C28;C22C38;B22F7;C22C38/06;C22C38/10;C22C38/16;

  • 国家 US

  • 入库时间 2022-08-21 12:16:55

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