首页> 外国专利> Method for producing silicon carbide single crystal in a solution process using a seed crystal having a bottom face with a circular shape and at least a partially removed section

Method for producing silicon carbide single crystal in a solution process using a seed crystal having a bottom face with a circular shape and at least a partially removed section

机译:使用具有底面为圆形且至少部分去除了截面的籽晶的溶液法制造碳化硅单晶的方法

摘要

A method for producing a SiC single crystal with few dislocations and defects and a large diameter enlargement ratio is provided. A method for producing a SiC single crystal by solution process, wherein a bottom face of a seed crystal is (0001) or (000-1) face and has circular shape with at least a partially removed section and a circular arc-shaped section on an outer periphery, the number of the removed sections is one or more, shapes of the removed sections are bow-shaped with a minor arc or semi-circumference removed along a chord connecting two points on the circular arc, a central angle formed by a center of the circular shape and the two points is 40° or greater, and a total of the central angles of the removed sections is no greater than 180°, the method comprising forming a meniscus and growing the single crystal from the bottom face.
机译:本发明提供一种位错,缺陷少,直径扩大率大的SiC单晶的制造方法。一种通过固溶法制备SiC单晶的方法,其中,籽晶的底面为(0001)或(000-1)面,并且具有至少部分被去除的截面和在其上具有圆弧形截面的圆形。外周,被去除部分的数目为一个或多个,被去除部分的形状为弓形,沿着连接圆弧上两个点的弦去除了小弧或半周长,中心角由圆形的中心和两个点为40°或更大,并且去除部分的中心角的总和不大于180°,该方法包括形成弯月面并从底面生长单晶。

著录项

  • 公开/公告号US10260167B2

    专利类型

  • 公开/公告日2019-04-16

    原文格式PDF

  • 申请/专利权人 TOYOTA JIDOSHA KABUSHIKI KAISHA;

    申请/专利号US201715714304

  • 发明设计人 KATSUNORI DANNO;

    申请日2017-09-25

  • 分类号C30B9/04;C30B29/36;C30B9/06;C30B19/04;C30B19/10;C30B29/40;

  • 国家 US

  • 入库时间 2022-08-21 12:15:37

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