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Matrices and sealants which are based on sulfur-containing polymers and which comprise a photoinitiator, curing and coating methods, and use of said matrices and sealants

机译:基于含硫聚合物的基质和密封剂,包括光引发剂,固化和涂覆方法,以及所述基质和密封剂的用途

摘要

A method for curing a mixture of a matrix and a curing agent based on sulfur-containing polymers on command and so rapidly that a tack-free surface results. A method for coating a substrate with the composition and of curing a sealant is also provided. The matrix and curing agent containing sulfur-containing polymers. The mixture is an uncured mixture with an isocyanate content, and the matrix is uncured and contains a mercaptan-terminated base polymer based on at least one polyether, polythioether, polysulfide or copolymers thereof. The uncured matrix, the curing agent, or both contain at least one photoinitiator based on sterically-inhibited tertiary amines. The mixture cures in the temperature range of −10 to +70° C. after the high-energy actinic radiation is applied. Corresponding matrices A, mixtures B, curing agents, sealant systems, and substrates, e.g., aircraft are contemplated.
机译:一种根据命令快速固化基于含硫聚合物的基体和固化剂混合物的方法,以使表面不粘。还提供了一种用该组合物涂覆基材并固化密封剂的方法。基质和固化剂含有含硫聚合物。该混合物是具有异氰酸酯含量的未固化的混合物,并且该基质是未固化的,并且包含基于至少一种聚醚,聚硫醚,多硫化物或其共聚物的硫醇封端的基础聚合物。未固化的基质,固化剂或两者均包含至少一种基于空间抑制的叔胺的光引发剂。施加高能光化辐射后,混合物在10至+70°C的温度范围内固化。考虑了相应的基质A,混合物B,固化剂,密封剂体系和基材,例如飞机。

著录项

  • 公开/公告号US10370562B2

    专利类型

  • 公开/公告日2019-08-06

    原文格式PDF

  • 申请/专利权人 CHEMETALL GMBH;

    申请/专利号US201314391590

  • 申请日2013-04-09

  • 分类号C09D181/04;B05D7/24;C08L81;B05D3/06;C09D181;C08L81/04;

  • 国家 US

  • 入库时间 2022-08-21 12:14:23

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