Dynamic patterning method that removes phase conflicts and improves pattern fidelity and CDU on a two phase-pixelated digital scanner

摘要

Phase conflicts in pattern transfer with phase masks can be resolve by exposing pattern features with a first pattern and a second pattern, wherein the second pattern is selected based on the phase conflicts. In scanned exposures using pulsed lasers, a number of exposures of the second pattern can be less than 20% of a total number of exposures.