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SUBSTRATE MEASUREMENT RECIPE DESIGN OF, OR FOR, A TARGET INCLUDING A LATENT IMAGE

机译:针对或包含潜像的目标的基质测量配方设计

摘要

A method including computing, in accordance with one or more parameters of a substrate measurement recipe, measurement with a latent image of a target and measurement with a post- development image corresponding to the latent image, to evaluate a characteristic determined from the computed measurement with the latent image of the target and determined from the computed measurement with the post-development image corresponding to the latent image; and adjusting the one or more parameters of the substrate measurement recipe and re-performing the computing, until a certain termination condition is satisfied with respect to the characteristic,
机译:一种方法,包括根据衬底测量配方的一个或多个参数,计算目标的潜像的测量值和对应于该潜像的显影后图像的测量值,以评估根据计算出的测量值确定的特性目标的潜像,并根据计算出的测量结果与潜像相对应的显影后图像确定;调整衬底测量配方的一个或多个参数,并重新进行计算,直到对该特性满足一定的终止条件为止,

著录项

  • 公开/公告号US2019171116A1

    专利类型

  • 公开/公告日2019-06-06

    原文格式PDF

  • 申请/专利权人 ASML NETHERLANDS B.V.;

    申请/专利号US201716323849

  • 发明设计人 HANS VAN DER LAAN;MIR HOMAYOUN SHAHRJERDY;

    申请日2017-07-21

  • 分类号G03F7/20;

  • 国家 US

  • 入库时间 2022-08-21 12:05:39

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