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SEMICONDUCTOR FABRICATION USING MACHINE LEARNING APPROACH TO GENERATING PROCESS CONTROL PARAMETERS
SEMICONDUCTOR FABRICATION USING MACHINE LEARNING APPROACH TO GENERATING PROCESS CONTROL PARAMETERS
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机译:使用机器学习方法生成过程控制参数的半导体制造
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摘要
A method for processing substrates includes subjecting each respective first substrate of a first plurality of substrates to a process that modifies a thickness of an outer layer of the respective first substrate, generating a plurality of groups of process parameter values; generating a plurality of removal profiles, training an artificial neural network by backpropagation using the plurality of groups of process parameter and plurality of removal profiles as training data where the artificial neural network has a plurality of input nodes to receive respective removal values from the removal profile and a plurality of output nodes to output control parameter values, for each respective second substrate of a second plurality of substrates determining a target removal profile, determining respective control parameter values to apply by applying the target removal profile to the input nodes, and subjecting each respective second substrate to the process using the respective control parameter values.
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