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Monocrystal and polycrystal texturing device

机译:单晶和多晶制绒装置

摘要

A monocrystal and polycrystal texturing device includes a device body, various stations arranged in the device body, a transmission device and a control system. The various stations are respectively a dipping acid texturing station, a spray washing station, a drying station, a spray alkali texturing station, a spray washing station, a dipping acid treatment station, a spray washing station, an acid treatment station, a spray washing station and a drying station arranged in sequence. The transmission device is for transmitting a silicon wafer to each station in sequence. The spray alkali texturing station is also connected with a heating device. The control system controls the working status of each station and the heating device. The technology of the present invention has the advantages of stable operation, high efficiency and reliability, and can conduct seamless switching among polycrystal acid texturing, monocrystal alkali texturing, monocrystal acid texturing, and monocrystal alkali texturing.
机译:单晶和多晶织构化装置包括装置主体,布置在装置主体中的各种工位,传输装置和控制系统。各个站分别是浸酸处理站,喷雾洗涤站,干燥站,喷雾碱处理站,喷雾洗涤站,浸酸处理站,喷雾洗涤站,酸处理站,喷雾洗涤站站和干燥站按顺序排列。传输装置用于将硅晶片顺序地传输到每个站。喷雾碱加弹站还连接有加热装置。控制系统控制每个工位和加热装置的工作状态。本发明的技术具有运行稳定,效率高,可靠性高的优点,可以在多晶酸织构,单晶碱织构,单晶酸织构和单晶碱织构之间进行无缝切换。

著录项

  • 公开/公告号US10177013B2

    专利类型

  • 公开/公告日2019-01-08

    原文格式PDF

  • 申请/专利权人 CHANGZHOU S.C EXACT EQUIPMENT CO. LTD.;

    申请/专利号US201815866736

  • 发明设计人 GUOJUN ZUO;

    申请日2018-01-10

  • 分类号H01L21/67;C30B33/10;H01L31/18;B08B3/02;C30B29/06;B08B3/04;H01L31/0236;

  • 国家 US

  • 入库时间 2022-08-21 12:04:17

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