A method of forming a patterned device includes depositing at least one nanostructure comprising self-assembled nucleic acids formed into a predetermined conformation upon a surface of a substrate, depositing a stabilizing layer of material mechanically stronger than the at least one nanostructure over the at least one nanostructure and the surface of the substrate to form a positive pattern template, depositing a layer of a first polymer over the positive pattern template, and removing the layer of the first polymer from connection with the positive pattern template, wherein the layer of the first polymer includes a surface having a negative imprint of the positive pattern template.
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