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Structure of a two-colour electro-luminescent diode and method for producing of the two-colour electro-luminescent diode structure
Structure of a two-colour electro-luminescent diode and method for producing of the two-colour electro-luminescent diode structure
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机译:二色电致发光二极管的结构和制造该二色电致发光二极管结构的方法
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摘要
The purpose of the notification is the structure of the two -colour electroluminescent diode (LED) based on the p -n connection and the way in which the two -colour electroluminescent diode structure is constructed.This structure has an n -GaN substrate, or a n -GaN substrate with a metal contact,in which it is unmixed or mixed with a type p buffer layer ZnO of 3 -50 nm thickness.The buffer layer, on the other hand, is mixed with arsenic and /or antimony and /or nitrogen with an appropriate layer of p -ZnO of 50 -5000 nm thickness with a second metal contact.This means that the substrate or the w -GaN layer with molecular beam epitaxy (MBE) is first carried out at a rate.350 -500 -C increase of the ZnO buffer layer, then the substrate is heated with this layer and only the mixed As and /or Sb and /or N of the appropriate p -ZnO layer is increased.Metallic contacts are made after this layer has been deposited and the structure is reheated.
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