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Structure of a two-colour electro-luminescent diode and method for producing of the two-colour electro-luminescent diode structure

机译:二色电致发光二极管的结构和制造该二色电致发光二极管结构的方法

摘要

The purpose of the notification is the structure of the two -colour electroluminescent diode (LED) based on the p -n connection and the way in which the two -colour electroluminescent diode structure is constructed.This structure has an n -GaN substrate, or a n -GaN substrate with a metal contact,in which it is unmixed or mixed with a type p buffer layer ZnO of 3 -50 nm thickness.The buffer layer, on the other hand, is mixed with arsenic and /or antimony and /or nitrogen with an appropriate layer of p -ZnO of 50 -5000 nm thickness with a second metal contact.This means that the substrate or the w -GaN layer with molecular beam epitaxy (MBE) is first carried out at a rate.350 -500 -C increase of the ZnO buffer layer, then the substrate is heated with this layer and only the mixed As and /or Sb and /or N of the appropriate p -ZnO layer is increased.Metallic contacts are made after this layer has been deposited and the structure is reheated.
机译:通知的目的是基于p -n连接的双色电致发光二极管(LED)的结构以及双色电致发光二极管结构的构造方法。该结构具有n -GaN衬底,或带有金属触点的-GaN基板,其中未混合或与3 -50 nm厚度的p型缓冲层ZnO混合。另一方面,该缓冲层与砷和/或锑和/或混合氮与适当的p -ZnO层厚度为50 -5000 nm的第二层金属接触,这意味着首先以一定速率进行具有分子束外延(MBE)的衬底或w -GaN层350 -500 -C增加ZnO缓冲层,然后用该层加热衬底,仅增加适当p -ZnO层的混合的As和/或Sb和/或N.在沉积该层后进行金属接触并重新加热结构。

著录项

  • 公开/公告号PL423464A1

    专利类型

  • 公开/公告日2019-05-20

    原文格式PDF

  • 申请/专利权人 INSTYTUT FIZYKI POLSKIEJ AKADEMII NAUK;

    申请/专利号PL20170423464

  • 发明设计人 ADRIAN KOZANECKI;EWA PRZEŹDZIECKA;

    申请日2017-11-14

  • 分类号H01L21;H01L21/26;H01L21/318;H01L33;C23C14;C23C14/08;

  • 国家 PL

  • 入库时间 2022-08-21 12:01:05

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