首页> 外国专利> ELECTROLESS NICKEL ALLOY PLATING BATHS, A METHOD FOR DEPOSITION OF NICKEL ALLOYS, NICKEL ALLOY DEPOSITS AND USES OF SUCH FORMED NICKEL ALLOY DEPOSITS

ELECTROLESS NICKEL ALLOY PLATING BATHS, A METHOD FOR DEPOSITION OF NICKEL ALLOYS, NICKEL ALLOY DEPOSITS AND USES OF SUCH FORMED NICKEL ALLOY DEPOSITS

机译:化学镍合金镀槽,镍合金的沉积方法,镍合金沉积物和这类镍合金沉积物的用途

摘要

The present invention relates to an electroless nickel alloy plating bath comprising nickel ions; further reducible metal ions selected from the group consisting of molybdenum ions, rhenium ions, tungsten ions, and mixtures thereof; at least one reducing agent suitable to reduce the nickel ions and the further reducible metal ions to their respective metallic state, at least three complexing agents CA1, CA2 and CA3 wherein each of CA1, CA2 and CA3 is independently selected from the group consisting of compounds having at least two carboxylic acid moieties, the respective salts thereof as well as mixtures of the aforementioned. The present invention further concerns a method for depositing nickel alloy deposits, their use and data storage devices comprising such alloys.
机译:本发明涉及一种包含镍离子的化学镀镍合金镀浴。选自钼离子,rh离子,钨离子及其混合物的其他可还原金属离子;至少一种适合将镍离子和进一步还原的金属离子还原成其各自金属态的还原剂,至少三种络合剂CA1,CA2和CA3,其中CA1,CA2和CA3各自独立地选自化合物具有至少两个羧酸部分的羧酸,其各自的盐以及前述的混合物。本发明还涉及一种用于沉积镍合金沉积物的方法,其用途以及包括这种合金的数据存储装置。

著录项

  • 公开/公告号WO2018220220A1

    专利类型

  • 公开/公告日2018-12-06

    原文格式PDF

  • 申请/专利权人 ATOTECH DEUTSCHLAND GMBH;

    申请/专利号WO2018EP64581

  • 发明设计人 LANG SEBASTIAN;

    申请日2018-06-04

  • 分类号C23C18/50;G11B5/858;

  • 国家 WO

  • 入库时间 2022-08-21 11:57:56

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