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METHOD OF PROCESSING DATA, METHOD OF OBTAINING CALIBRATION DATA

机译:处理数据的方法,获得校​​准数据的方法

摘要

Methods for processing data from a metrology process and for obtaining calibration data are disclosed. In one arrangement, measurement data is obtained from a metrology process. The metrology data is applied to a target on a substrate. The metrology process comprises illuminating the target with measurement radiation and detecting radiation redirected by the target. The measurement data comprises at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method further comprises analysing the at least a component of the detected pupil representation to determine either or both of a position property and a focus property of a radiation spot of the measurement radiation relative to the target.
机译:公开了用于处理来自计量过程的数据以及用于获得校准数据的方法。在一种布置中,从计量过程获得测量数据。计量数据被应用于基板上的目标。计量过程包括用测量辐射照亮目标并检测由目标重定向的辐射。测量数据至少包括在光瞳平面中所检测的光瞳表示的重定向辐射的光学特性的分量。该方法还包括分析检测到的瞳孔表示的至少一个分量,以确定测量辐射相对于目标的辐射点的位置特性和聚焦特性中的一个或两个。

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