首页>
外国专利>
METHOD FOR THE FABRICATION OF ULTRALOW VOLTAGE OPERATED, REDUCED BIAS STRESS, MULTI-LAYER DIELECTRIC SYSTEM COMPRISING N-TYPE ORGANIC FIELD EFFECT TRANSISTORS
METHOD FOR THE FABRICATION OF ULTRALOW VOLTAGE OPERATED, REDUCED BIAS STRESS, MULTI-LAYER DIELECTRIC SYSTEM COMPRISING N-TYPE ORGANIC FIELD EFFECT TRANSISTORS
展开▼
机译:包含N型有机场效应晶体管的超低压操作,减小的Bias应力多层电介质的制造方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention reports an ultra-low voltage operated, highly stable, n-type Organic Field Effect Transistor (OFET) device and a method for fabricating such OFET device. The OFET device of the present invention includes a base substrate (1); a gate electrode (3) deposited on said base substrate; layered hybrid dielectrics (4-5-6) deposited on said gate electrode having top and bottom dielectric layer of low dielectric constant based dielectric materials and intermediate dielectric layer of high dielectric constant based dielectric material; n-type organic semiconducting layer (7) based active channel deposited on top of said layered hybrid dielectrics and a source electrode and a drain electrode (8, 9) deposited on the top side of said n-type organic semiconducting layer.
展开▼