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METHOD FOR PREPARING LOW-RADIATION COATED GLASS

机译:低辐射镀膜玻璃的制备方法

摘要

Disclosed in the present invention is a method for preparing low-radiation coated glass, comprising the steps of: loading glass to a frame; performing cleaning treatment; and observing in an observation room. A coating process comprises: sequentially forming a first SiNx film layer, a first nickel-chromium film layer, an Ag film layer, a second nickel-chromium film layer, and a second SiNx film layer on a glass substrate. According to the method for preparing low-radiation coated glass in the present invention, a magnetron sputtering coating method is used to coat a glass substrate with a plurality of film layers, and the coatings are firm and abrasion-proof. A SiNx film layer is used in the coated glass prepared by the method for preparing low-radiation coated glass in the present invention, can be directly applied on a glass surface to serve as a sodium ion blocking layer, and is good in acid and alkali resistance and is scratch resistant.
机译:本发明公开了一种低辐射镀膜玻璃的制备方法,包括以下步骤:将玻璃装载到框架上;以及将玻璃装载到框架上。进行清洁处理;并在观察室观察。涂覆工艺包括:在玻璃基板上依次形成第一SiNx膜层,第一镍铬膜层,Ag膜层,第二镍铬膜层和第二SiNx膜层。根据本发明的低辐射涂覆玻璃的制备方法,磁控溅射涂覆法用于在玻璃基板上涂覆多个膜层,并且该涂层坚固且耐磨。在通过本发明的低辐射镀膜玻璃的制备方法制备的镀膜玻璃中,使用了SiNx膜层,可以直接涂覆在玻璃表面上作为钠离子阻挡层,并且耐酸碱耐刮擦性。

著录项

  • 公开/公告号WO2019157799A1

    专利类型

  • 公开/公告日2019-08-22

    原文格式PDF

  • 申请/专利权人 JIANGSU AOLAN GLASS ENGINEERING CO. LTD.;

    申请/专利号WO2018CN100326

  • 发明设计人 HUANG LISHA;GU HAIBO;

    申请日2018-08-14

  • 分类号C03C17/36;

  • 国家 WO

  • 入库时间 2022-08-21 11:53:34

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