SYSTEM FOR MEASURING FLATNESS OF A WAFER AND METHOD FOR MEASURING FLATNESS USING THE SAME

摘要

A flatness measuring unit for measuring a flatness parameter value of the standard wafer using the first light and a flatness measuring unit for measuring a flatness value measured by the flatness measuring unit, And a control unit for controlling the intensity of the first light so that the calculated difference is within a predetermined error range, and the reference value is a known flatness parameter value of the standard wafer to be.