An aspect of the present invention provides a multi-charged particle beam drawing apparatus and a multi-charged particle beam drawing method with which maximum irradiation time can be shortened in multi beam drawing. According to the aspect of the present invention, the multi-charged particle beam drawing apparatus comprises: a combination setting processing circuit for setting a plurality of combinations made by three beams whose actual irradiation positions surround a design grid by using 4 or more beams whose actual irradiation positions are adjacent to design grids for each of several design grids, which is a position on a design to be irradiated with the multi-charged particle beam; a first distribution coefficient operation processing circuit for operating a first distribution coefficient for each of the three beams constituting a combination in order to distribute a dose amount with which the design grid is to be irradiated so that a central position and a sum of distributed dose amounts after distribution are consistent with the corresponding design gird position and a dose amount with which the design grid is to be irradiated for each of the combinations; and a second distribution coefficient operation processing circuit for operating a second distribution coefficient for each of the above-mentioned 4 or more beams to the corresponding design grid wherein the second distribution coefficient is a result from dividing the sum of the first distribution coefficients for the beams by the number of the several combinations.;COPYRIGHT KIPO 2019
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