To provide an apparatus capable of reducing a shape error of a pattern due to an excessive dose by a simple method in multi-beam drawing.SOLUTION: A multi-charged particle beam drawing apparatus according to one embodiment of the present invention comprises: an electron gun 201 which emits a charged particle beam; a molding aperture array substrate 203 which is irradiated with the charged particle beam to form a multi-charged particle beam; a subtraction part 71 which subtracts a corresponding in-partial-charge dosage from respective dosages of beam groups in a circumference of a defective beam whose dosage of irradiation becomes excessive since dosage control over the beam cannot be performed among multi-charged particle beams so that beam groups in the circumference of the defective beam take partial charge of a dosage similar to the excessive of the defective beam; and a drawing mechanism 150 which uses the multi-charged particle beams of the dosage after the dosage similar to the excessive dosage of the defective beam is subtracted from the dosages of the beam groups in the circumference to draw a pattern on a sample.SELECTED DRAWING: Figure 1
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