首页> 外国专利> SHOWERHEAD ASSEMBLY FOR DISTRIBUTING A GAS WITHIN A REACTION CHAMBER AND A METHOD FOR CONTROLLING THE TEMPERATURE UNIFORMITY OF A SHOWERHEAD ASSEMBLY

SHOWERHEAD ASSEMBLY FOR DISTRIBUTING A GAS WITHIN A REACTION CHAMBER AND A METHOD FOR CONTROLLING THE TEMPERATURE UNIFORMITY OF A SHOWERHEAD ASSEMBLY

机译:用于在反应室内分配气体的喷头组件和控制喷头组件的温度均匀性的方法

摘要

Disclosed is a shower head assembly to distribute gas in a reaction chamber, capable of controlling temperature uniformity crossing a surface of a gas distribution assembly. According to the present invention, the shower head assembly comprises a chamber formed therein and a gas distribution assembly adjacent to the chamber. The gas distribution assembly comprises a first gas distribution plate including upper and lower surfaces, and a second gas distribution plate including upper and lower surfaces. The second gas distribution plate is disposed on the upper part of the first gas distribution plate. Moreover, the gas distribution assembly comprises one or more heating structures disposed between the first and second gas distribution plates, and a plurality of openings extended from the upper surface of the second distribution plate to the lower surface of the first distribution plate. Moreover, disclosed is a method to control temperature uniformity in a shower head assembly for distributing gas in a reaction chamber.
机译:公开了一种喷淋头组件,用于在反应室中分配气体,该喷淋头组件能够控制穿过气体分配组件的表面的温度均匀性。根据本发明,喷头组件包括在其中形成的腔室和与该腔室相邻的气体分配组件。气体分配组件包括具有上表面和下表面的第一气体分配板以及具有上表面和下表面的第二气体分配板。第二气体分配板布置在第一气体分配板的上部。此外,气体分配组件包括布置在第一和第二气体分配板之间的一个或多个加热结构,以及从第二分配板的上表面延伸到第一分配板的下表面的多个开口。此外,公开了一种控制喷淋头组件中的温度均匀性以在反应室中分配气体的方法。

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