FILM TYPE INFRARED CUTOFF FILTER AND MANUFACTURING METHOD THEREOF

摘要

The present invention provides a film type infrared cutoff filter and a manufacturing method thereof. The film type infrared cutoff filter comprises: a transparent substrate; a reflection preventing layer formed on a first surface of the transparent substrate; an IR reflection layer formed on a second surface of the transparent substrate; a first adhesion layer formed between the transparent substrate and the reflection preventing layer; a second adhesion layer formed between the transparent substrate and the IR reflection layer; and a light absorption layer formed between the reflection preventing layer and the first adhesion layer and between the IR reflection layer and the second adhesion layer, thereby being effective in coping with curl phenomena and foreign materials and lowering a haze value by dispersing an absorbent only on the adhesion layer and the light absorption layer, not on all of the film.;COPYRIGHT KIPO 2019