首页> 外国专利> ARRAY OF GRAPHENE QUNANTUM DOTS EMBEDDED IN HEXAGONAL BORON NITRIDE AND MANUFACTURING METHOD FOR THE SAME ELECTRONIC DEVICE COMPRISING FOR THE SAME

ARRAY OF GRAPHENE QUNANTUM DOTS EMBEDDED IN HEXAGONAL BORON NITRIDE AND MANUFACTURING METHOD FOR THE SAME ELECTRONIC DEVICE COMPRISING FOR THE SAME

机译:六方氮化硼中埋藏的石墨烯量子点的阵列及其制造方法

摘要

The present invention relates to the design of graphene quantum dots, and more particularly, to a thin film in which graphene quantum dots usable in various electronic devices are formed in hexagonal boron nitride and a manufacturing method thereof. The quantum dots formed in hexagonal boron nitride according to one side of the present invention, in s a thin film formed in a hexagonal boron nitride thin film, includes one or more graphene quantum dots (GQDs) where the sites of a plurality of adjacent nitrogen atoms and boron atoms (site) are substituted for the sites of carbon atoms. The graphene quantum dots can be applied to transistors, memory devices, optoelectronic devices, semiconductor devices.
机译:技术领域本发明涉及石墨烯量子点的设计,更具体地,涉及在六方氮化硼中形成可用于各种电子设备的石墨烯量子点的薄膜及其制造方法。在根据本发明的一侧的在六方氮化硼中形成的量子点在由六方氮化硼薄膜形成的薄膜中包括一个或多个石墨烯量子点(GQD),其中多个相邻氮原子的位置硼原子(位)被碳原子的位取代。石墨烯量子点可以应用于晶体管,存储器件,光电器件,半导体器件。

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