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THIN FILM DEPOSITION APPARATUS INCLUDING NEBULIZER AND METHOD OF DEPOSITING THIN FILM USING THE SAME
THIN FILM DEPOSITION APPARATUS INCLUDING NEBULIZER AND METHOD OF DEPOSITING THIN FILM USING THE SAME
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机译:包括喷雾器的薄膜沉积设备和使用该薄膜沉积设备的方法
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摘要
The present invention relates to a thin film deposition apparatus including a nebulizer and a thin film deposition method using the same. According to an embodiment of the present invention, the thin film deposition apparatus including a nebulizer comprises: a first reaction chamber and a second reaction chamber in which a deposition process is performed on a substrate and which includes a doorway where the substrate moves in and out; a first raw material supply unit which includes a nebulizer for supplying raw materials into the first reaction chamber; a second raw material supply unit which includes a nebulizer for supplying raw materials into the second reaction chamber; a plate portion which includes a substrate stage for supporting the substrate and a plate rod for supporting the substrate stage and moving into the first reaction chamber and the second reaction chamber; and a plate rail portion which is connected to one end of the plate portion, and moves the plate portion to move the substrate stage into the first reaction chamber and the second reaction chamber. The present invention can deposit various materials on a substrate efficiently and stably.
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