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THIN FILM DEPOSITION APPARATUS INCLUDING NEBULIZER AND METHOD OF DEPOSITING THIN FILM USING THE SAME

机译:包括喷雾器的薄膜沉积设备和使用该薄膜沉积设备的方法

摘要

The present invention relates to a thin film deposition apparatus including a nebulizer and a thin film deposition method using the same. According to an embodiment of the present invention, the thin film deposition apparatus including a nebulizer comprises: a first reaction chamber and a second reaction chamber in which a deposition process is performed on a substrate and which includes a doorway where the substrate moves in and out; a first raw material supply unit which includes a nebulizer for supplying raw materials into the first reaction chamber; a second raw material supply unit which includes a nebulizer for supplying raw materials into the second reaction chamber; a plate portion which includes a substrate stage for supporting the substrate and a plate rod for supporting the substrate stage and moving into the first reaction chamber and the second reaction chamber; and a plate rail portion which is connected to one end of the plate portion, and moves the plate portion to move the substrate stage into the first reaction chamber and the second reaction chamber. The present invention can deposit various materials on a substrate efficiently and stably.
机译:包括喷雾器的薄膜沉积设备和使用其的薄膜沉积方法技术领域本发明涉及一种包括喷雾器的薄膜沉积设备和使用该薄膜沉积设备的薄膜沉积方法。根据本发明的实施例,包括喷雾器的薄膜沉积设备包括:第一反应室和第二反应室,在第一反应室和第二反应室中对基板进行沉积处理,并且包括门口,在该门口中基板进出移动。 ;第一原料供应单元,其包括用于将原料供应到第一反应室中的喷雾器;第二原料供应单元,其包括用于将原料供应到第二反应室中的喷雾器;板部,其包括用于支撑基板的基板台和用于支撑基板台并移动到第一反应室和第二反应室中的板杆。板轨道部分,其连接到板部分的一端,并且移动板部分以使基板台移动到第一反应室和第二反应室中。本发明可以有效且稳定地在基板上沉积各种材料。

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